Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source
نویسندگان
چکیده
منابع مشابه
Debris and Radiation-Induced Damage Effects on EUV Nanolithography Source Collector Mirror Optics Performance
Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the ...
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High harmonic generation (HHG) provides a laboratory scale source of coherent radiation ideally suited to lensless coherent diffractive imaging (CDI) in the EUV and X-ray spectral region. Here we demonstrate transmission EUV ptychography, a scanning variant of CDI, using radiation at a wavelength around 29 nm from an HHG source. Image resolution is diffraction-limited at 54 nm, and fields of vi...
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ژورنال
عنوان ژورنال: Applied Physics Express
سال: 2016
ISSN: 1882-0778,1882-0786
DOI: 10.7567/apex.9.076701